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LANXESS Ion Exchange For Semiconductor and Photovoltaic

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Thương hiệu: LANXESS
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Danh mục: Ion Exchange Resin

Special ion exchange resins from the Lewatit® UltraPure (UP) series play a significant role in producing ultrapure water reliably and efficiently. These include individual resins as well as working mixed beds and final polishers. They are all characterized by a particularly low release of organic matter and therefore contribute little to any increase in TOC con­ centration in the process sequence (low ΔTOC, total organic carbon). What is more, the discharge of metals and particles right down to the nanometer range is reduced to a minimum. To produce UPW, fresh water or recycled process water is first demineralized. Then, it is taken through final polishing to reach the required extremely low levels of conductivity. After final polishing with special ion exchangers, the water obtained will be of the highest purity. If necessary, the particle content of the water is reduced further through a series of filtration steps. In addition to the filtration steps, special ion exchangers enable the formation of particles due to resin erosion in the course of UPW production to be prevented from the outset. To that end, the aggressive hydrogen peroxide is removed from the water.

Strong Acidic Cation Exchange Resins

Product

Product Matrix

Ionic Form

Bead Size (mm):

Monodisperse:

(MD, mean value) Heterodisperse: (HD, share > 90%)

Total Capacity (eq/l) min.

Volume Change (%) max.

Water Retention (%)

Applications

Lewatit® UltraPure 1213 MD

Styrene/DVB gel

H+

MD: 0.60

(+/– 0.05)

2.1

–6

(H+ → Na+)

45–50

Uniform particle size high­purity cation exchanger

Lewatit® UltraPure 1216 MD

Styrene/DVB gel

H+

MD: 0.55

(+/– 0.05)

2.1

–8

(H+ → Na+)

45–50

Uniform particle size high­purity cation exchanger

Medium Base Anion Exchange Resins

Product

Product Matrix

 

 

 

Ionic Form

Bead Size (mm):

Monodisperse:

(MD, mean value) Heterodisperse: (HD, share > 90%)

Total Capacity (eq/l) min.

Volume Change (%) max.

Water Retention (%)

Applications

Lewatit® UltraPure 1231 MD

Styrene/DVB macroporous

FB/Cl­

MD: 0.59

(+/– 0.05)

1.4

24

(del. Form → Cl­)

61–66

Ultrapure water

Strong Base Anion Exchange Resins – Type I

Product

Product Matrix

 

 

 

Ionic Form

Bead Size (mm):

Monodisperse:

(MD, mean value) Heterodisperse: (HD, share > 90%)

Total Capacity (eq/l) min.

Volume Change (%) max.

Water Retention (%)

Applications

Lewatit® UltraPure 1241 MD

Styrene/DVB gel

Cl­

MD: 0.62

(+/– 0.05)

1.3

22

(C­ → OH­)

48–55

Ultrapure water

Lewatit® UltraPure 1243 MD

Styrene/DVB gel

OH­

MD: 0.64

(+/– 0.06)

1.1

–22

(C­ → OH­)

56–66

Ultrapure water

Lewatit® UltraPure 1261 MD

Styrene/DVB macroporous

Cl­

MD: 0.62

(+/– 0.05)

1.1

22

(C­ → OH­)

60–65

Ultrapure water

Lewatit® K 7333

Styrene/DVB gel

OH­

MD: 0.64

(+/– 0.06)

1.1

–22

(C­ → OH­)

56–66

Ultrapure water

Mixed Bed: Strong Acidic Cation Exchange Resins / Strong Base Anion Exchange Resins

Product

Product Matrix

Ionic Form

Bead Size (mm):

Monodisperse:

(MD, mean value) Heterodisperse: (HD, share > 90%)

Total Capacity (eq/l) min.

Volume Change (%) max.

Water Retention (%)

Applications

Lewatit® NM 60 SG

Styrene/

DVB gel

H+/OH­

HD: 0.40–0.65

(effective size)

0.55**

–15

(H+/OH­ → Ca2+,

2­     ­

Mg2+, SO4 , Cl )

50–60

Production of very pure water for semiconductor industry

 

Lewatit® UltraPure

1292 MD

Styrene/

DVB gel

H+/OH­

MD:

0.67 +/– 0.05 A

0.60 +/– 0.07 C

2.1 C/1.1 A

–15

(H+/OH­ → Ca2+,

Mg2+, SO 2­, Cl­)

4

SAC 45–50

SBA 59–65

Ultrapure water, very low TOC leaching

 

Lewatit® UltraPure

1294 MD

Styrene/

DVB gel

H+/OH­

MD:

0.67 +/– 0.05 A

0.60 +/– 0.07 C

2.1 C/ 1.1 A

–15

(H+/OH­ → Ca2+,

Mg2+, SO 2­, Cl­)

4

SAC 45–50

SBA 59–65

Polishing to get 18+ megohm water (pharmaceutical and semiconductor industries)

Lewatit® UltraPure

1296 MD

Styrene/

DVB gel

H+/OH­

MD:

0.67 +/– 0.07 A

0.50 +/– 0.05 C

2.0 C/ 1.1 A

–15

(H+/OH­ → Ca2+,

Mg2+, SO 2­, Cl­)

4

SAC 46–52

SBA 59–65

Polishing to get 18+ megohm water (pharmaceutical and semiconductor industries)

Lewatit® UltraPure

1297 MD

Styrene/

DVB gel

H+/OH­

MD:

0.64 +/– 0.02 A

0.35 +/– 0.02 C

2.1 C/1.1 A

–14

(H+/OH­ → Ca2+,

Mg2+, SO 2­, Cl­)

4

SAC 47–53

SBA 60–65

Polishing to get 18+ megohm water (pharmaceutical and semiconductor industries), less separable

** Operational capacity, end point 0.02 MOhm* cm

 

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